ASML has shown a 250W radiation source for lithography in the hard ultraviolet range

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The industry has finally come close to introducing in the serial production of lithography in the hard ultraviolet range (EUV), promising in the transition to more subtle standards of the technological process. Developments in this area have been going on for a long time, but one of the stumbling blocks was the radiation source. More precisely, the lack of a source, the power of which would be sufficient to ensure the performance, typical for mass production.

It seems that this obstacle is eliminated. This week, ASML, which manufactures equipment for semiconductor production, demonstrated at the Semicon West exhibition a source of EUV radiation with a power of 250 watts.

It is alleged that such a source will allow processing 125 plates per hour.

The idea of ​​the pace of development is given by the following fact: in 2012, a 25W EUV source was demonstrated.

According to ASML, one installation for EUV lithography will cost at least $ 100 million. However, its operation is economically more justified in comparison with immersion lithography with three or four templates.

Intel, Samsung, TSMC and Globalfoundries are planning to introduce EUV lithography in mass production in the next two years.

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